MTU Library Catalogue

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Fundamentals of microelectronics processing / Hong H. Lee.

By: Lee, Hong H.
Material type: materialTypeLabelBookSeries: McGraw-Hill chemical engineering series.Publisher: London : McGraw-Hill, 1990Description: xvi, 514 p. : ill. ; 24 cm. + pbk.ISBN: 0071007962 ; 0070370567 .Subject(s): Integrated circuits -- Design and construction | Integrated circuits -- MaterialsDDC classification: 621.3815
Contents:
Integrated circuits and fabrication -- Silicon refining and other raw materials / J. V. Cole -- Bulk crystal growth -- Electrical characteristics of processed materials -- Chemical rate processes and kinetics -- Chemical vapor deposition reactors -- Incorporation and transport of dopants -- Pattern generation, transfer and delineation -- Physical and physicochemical rate processes -- Physical vapor deposition apparatuses and plasma reactors -- Packaging.
Holdings
Item type Current library Call number Copy number Status Barcode
General lending MTU Bishopstown Library Lending 621.3815 (Browse shelf(Opens below)) 1 Available 00070394
Total holds: 0

Enhanced descriptions from Syndetics:

This new text introduces the material of each process type by explaining the underlying chemical engineering (and physical) principles. For microelectronic processing courses the text progresses from an overview of microelectronics processing through a logically-sequenced discussion of the processes leading to integrated circuits. The author is very careful to define terms that may be unfamiliar to chemical engineers, to provide numerous examples to aid in their understanding, and to include ample end-of-chapter problems.

Includes bibliographical references and index.

Integrated circuits and fabrication -- Silicon refining and other raw materials / J. V. Cole -- Bulk crystal growth -- Electrical characteristics of processed materials -- Chemical rate processes and kinetics -- Chemical vapor deposition reactors -- Incorporation and transport of dopants -- Pattern generation, transfer and delineation -- Physical and physicochemical rate processes -- Physical vapor deposition apparatuses and plasma reactors -- Packaging.